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The aim of this work is to realize a rigorous study of many different types of in-plane gate (IPG) transistors and finally, to propose several applications based on these transistors. The IPG transistors are fabricated by focused ion beam (FIB)
implantation in negative and positive pattern definition. Various theoretical models for I-V characteristics are proposed and analyzed in detail. A comparison between the I-V characteristics at room temperature and liquid helium temperature is performed
for IPG transistors fabricated in negative pattern definition. The positive pattern definition technique allows the fabrication of both n- and p-channel transistors for p- and similar for n-type heterostructures. Consequently,
the fabrication of IPG transistors in positive pattern definition was divided in four cases, every case being separately treated. For the first time an electron pump with two IPG transistors is reported. Different logic circuits with IPG transistors are
proposed.
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